Lam Research
2300 alternatives
Comparable Etch equipment documented in the Waferpedia catalog.
6 comparable tools
Oxford Instruments
Plasmalab 80 Plus RIE
8"
Etch
Oxford Instruments Plasmalab 80 Plus RIE is a reactive ion etcher with support for wafers up to 8 inches.
Lam Research
Rainbow 4520
8"
Etch
Lam Research Rainbow 4520 is a single-wafer plasma/RIE etching system described as part of the Rainbow 45XX series.
Applied Materials
0010 47763
Etch
The Applied Materials 0010-47763 is an electrostatic chuck (ESC) assembly used in semiconductor etching processes.
Applied Materials
0010-16392 ESC Assembly
Etch
The Applied Materials 0010-16392 is an electrostatic chuck assembly designed for 300 mm wafer processing, featuring a dual electrode configuration.
Applied Materials
0041-39086 ESC Part
Etch
Oxford Instruments
100 ICP Fluorine
Etch
Oxford Instruments 100 ICP Fluorine is an inductively coupled plasma etcher for fluorine-based etching, supporting cryo DRIE and multiple etch gases including SF6 and C4F8.
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