Comparison ledger
KLA .498 PSL Wafer, Zeiss Axio CSM 700, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | Axio CSM 700Zeiss | |
|---|---|---|
| OEM | KLA | Zeiss |
| Category | Metrology & Inspection | Metrology & Inspection |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | KLA .498 PSL Wafer | Zeiss Axio |
| Specifications | ||
| Configuration | NIST Traceable[1] | with controller[2] |
| NIST traceability | Yes[1] | — |
| Microscope type | — | Confocal microscope[3] |
| Scanning stage travel range | — | 150 x 150 mm[3] |
| Measurement rate | — | More than 100 frames per second[3] |
| Step height measurement range | — | 20 nm up to the millimetre range[3] |
| Depth of focus | — | Previously only offered by scanning electron microscopes (SEMs)[3] |
| Software analysis options | — | Measurement of roughness, evaluation of layer thickness, particle analysis[3] |
| Mosaic function | — | Captures large sample areas with a stitching algorithm that eliminates transitions in the final image[3] |
| Imperial units integration | — | Inches and microinches integrated into software[3] |
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