Comparison ledger
KLA .498 PSL Wafer, Malvern Panalytical NS300, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | NS300Malvern Panalytical | |
|---|---|---|
| OEM | KLA | Malvern Panalytical |
| Category | Metrology & Inspection | Metrology & Inspection |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | KLA .498 PSL Wafer | Malvern Panalytical NS300 |
| Specifications | ||
| Configuration | NIST Traceable[1] | — |
| NIST traceability | Yes[1] | — |
| Measurement technique | — | Nanoparticle Tracking Analysis (NTA)[2] |
| Particle size range | — | 30 to 800 nm[2] |
| Particle concentration range | — | 10^6 to 10^9 particles/mL[2] |
| Laser wavelength | — | 532 nm[2] |
| Temperature range | — | 20 to 50 C[2] |
| Sample volume required | — | ~1 mL[2] |
| Microscope magnification | — | 20X[2] |
| Camera frame rate | — | 30 frames per second[2] |
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