Comparison ledger
KLA .204 PSL Wafer, Nikon LV100ND, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | LV100NDNikon | |
|---|---|---|
| OEM | KLA | Nikon |
| Category | Metrology & Inspection | Metrology & Inspection |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | KLA .204 PSL Wafer | Nikon LV100ND |
| Specifications | ||
| Configuration | NIST Traceable[1] | — |
| Wafer Size | 8 inch[1] | — |
| Traceability | NIST[2] | — |
| Compatible Tools | Surfscan 6xy0, Sp1[1] | — |
| NIST Traceable | Yes[1] | — |
| Microscope type | — | Optical microscope[3] |
| Lighting | — | Top and bottom lighting using LED white light with adjustable intensity[3] |
| Objectives | — | 5X, 10X, 20X, 50X, and 100X Plan Fluor high numerical aperture lenses[3] |
| Brightfield / darkfield | — | 10X Ultra Wide Field brightfield and darkfield for all five lenses[3] |
| DIC | — | Selectable Nomarski Differential Interference Contrast for top-down lighting only[3] |
| Stage | — | 6" x 4" XY stage with glass plate[3] |
| Condenser | — | Abbe condenser[3] |
| Camera | — | DS-Ri2 Nikon camera, high definition 18 megapixel[3] |
| Software | — | Nikon NIS-Elements D Software[3] |
| Instrument count and locations | — | Two microscopes in the Flexible Cleanroom and two in the Nanopatterning Cleanroom[3] |
| Eyepiece | — | 10X Ultra Wide Field[3] |
| Illumination | — | Top and bottom lighting using LED white light with adjustable intensity[3] |
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