Comparison ledger
KLA 1.112 PSL Wafer, LEO 1450 VP, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 1450 VPLEO | |
|---|---|---|
| OEM | KLA | LEO |
| Category | Metrology & Inspection | Metrology & Inspection |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | KLA 1.112 PSL Wafer | LEO 1450 VP |
| Cited variants | — |
|
| Specifications | ||
| Configuration | NIST Traceable[2] | Variable Pressure SEM Platform[1] |
| Wafer Size | 8 inch[2] | — |
| NIST Traceable | True[2] | — |
| Compatible Tools | Surfscan 6xy0 and Sp1[3] | — |
| Resolution | — | 3.5 nm at 30 kV at optimum working distance[4] |
| Acceleration voltage | — | 0.2 kV to 30 kV[4] |
| Probe current | — | 10 pA to 1000 nA[4] |
| Magnification | — | x9 to x900,000[4] |
| Working distance | — | 0.1 mm to 50 mm[4] |
| Chamber dimensions | — | 300 mm x 270 mm x 224 mm (H)[4] |
| Stage | — | 5 axes: X/Y = 100/125 mm, Z = 60 mm (35 mm motorized), T = 0° to +90°, 360° continuous rotation[4] |
| Variable pressure range | — | 1 Pa to 400 Pa[4] |
| Maximum sample weight | — | 500 g[4] |
| Detectors | — | SE1 (secondary electron), BSE (backscattered electron), VPSE (variable-pressure secondary electron)[4] |
| EDX detector | — | Silicon Drift 80 mm² nominal active surface; SATW light window; detection from beryllium to uranium[4] |
| Electron source | — | Tungsten filament[5] |
| X-ray microanalysis | — | Mounted EDAX EDS Microanalysis Detector Tower[1] |
| Active isolation | — | Integrated Kinetic Systems Vibraplane pneumatic active vibration dampening table frame[1] |
| Control software | — | SmartSEM column control software[1] |
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