Comparison ledger
KLA 1.112 PSL Wafer, KLA Surfscan 6220, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | ||
|---|---|---|
| OEM | KLA | KLA |
| Category | Metrology & Inspection | Metrology & Inspection |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | KLA 1.112 PSL Wafer | KLA Surfscan 6220 |
| Specifications | ||
| Configuration | NIST Traceable[1] | Single Phase[3] |
| Wafer Size | 8 inch[1] | — |
| NIST Traceable | True[1] | — |
| Compatible Tools | Surfscan 6xy0 and Sp1[2] | — |
| Frequency | — | 60 Hz[3] |
| Voltage | — | 208 V[3] |
| Equipment type | — | Bare wafer surface defect inspection system / Particle inspection system[4] |
| Substrate sizes (inch) | — | 2", 3", 4", 6", 8"[4] |
| Substrate sizes (metric) | — | 100 mm, 125 mm, 150 mm, 200 mm (round or rectangular)[5] |
| Wafer thickness | — | SEMI Standard Wafer Thickness[4] |
| Material compatibility | — | Any opaque, polished surface which scatters less than 5 percent of incident light[4] |
| Defect sensitivity (most surfaces) | — | Better than 0.20 µm @ 95% capture rate[5] |
| Defect sensitivity (polished surfaces) | — | Better than 0.10 µm @ 95% capture rate[5] |
| Defect sensitivity (bare silicon) | — | 0.12 µm[5] |
| Defect sensitivity (PSL sphere equivalent) | — | 0.09 µm diameter @ >80% capture rate (0.112 µm @ 90%)[4] |
| Count repeatability | — | Error less than 0.5% at 1 standard deviation (mean count >500, 0.364 mm dia. latex spheres)[4] |
| Count repeatability (alternate) | — | Less than 1.0% at 1 standard deviation (mean count >500, 0.204 µm diameter latex spheres on bare silicon)[5] |
| Count accuracy | — | Better than 99% (verified with VLSI Standards’ Relative Standard)[4] |
| Throughput | — | 100 wph (200 mm) at 0.12 µm[4] |
| Contamination | — | Less than 0.005 particles/cm² >0.15 µm diameter per single pass[4] |
| Contamination (alternate) | — | Less than 0.005 particles/cm >0.15 µm[5] |
| Haze sensitivity | — | 0.02 ppm[5] |
| Illumination source | — | 30 mW Argon-Ion laser, 488 nm wavelength[4] |
| Spatial resolution | — | 50 µm[5] |
| Signal integration | — | 2D signal integration[5] |
| Wafer handling | — | Single puck wafer handling from two cassettes (one sender/receiver, one receiver); non-contaminating robotic handler[4] |
| Wafer handling (alternate) | — | Non-contaminating robotic handler; random access sender/receiver unit[5] |
| Operator interface | — | Mouse and/or dedicated user keypad[4] |
| Electrical requirements | — | Single phase, 60 Hz, 17 A, 208 V[3] |
| OEM | — | KLA[3] |
| Model | — | Surfscan 6220[3] |
| Product type | — | Wafer Particle Detection System[6] |
| Wafer sizes | — | 2", 3", 4", 6", and 8" wafers[4] |
| Substrate sizes | — | 100, 125, 150, and 200 mm (round or rectangular substrates)[5] |
| Sensitivity | — | 0.09 micrometer diameter PSL sphere equivalent with greater than 80 percent capture rate[4] |
| Repeatability | — | Count repeatability error less than 0.5 percent at 1 standard deviation[4] |
| Accuracy | — | Count accuracy better than 99 percent[4] |
| Cassette handling | — | Single puck wafer handling from two cassettes (one sender/receiver, one receiver)[4] |
| Vintage | — | 1996[3] |
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