Comparison ledger
Hitachi S 3700 N, KLA 1.112 PSL Wafer, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | S 3700 NHitachi | |
|---|---|---|
| OEM | Hitachi | KLA |
| Category | Metrology & Inspection | Metrology & Inspection |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Hitachi S 3700 N | KLA 1.112 PSL Wafer |
| Specifications | ||
| Configuration | Large chamber[1] | NIST Traceable[3] |
| Type | Scanning Electron Microscope (SEM)[1] | — |
| Wafer size | 12 inch[1] | — |
| Observable area | up to 203 mm in diameter[1] | — |
| Maximum sample height for observation and EDS analysis | up to 110 mm tall[1] | — |
| Analytical capabilities | EDS, EBSD and WDS simultaneously available[1] | — |
| Stage | 5-axis computer eucentric motorized stage with -20/+90* tilt[1] | — |
| Operating modes | One-button selectable High Vacuum / Low Vacuum modes[1] | — |
| SEM class | Ultra Large VP-SEM[2] | — |
| Wafer Size | — | 8 inch[3] |
| NIST Traceable | — | True[3] |
| Compatible Tools | — | Surfscan 6xy0 and Sp1[4] |
Plan your fab
Building a Metrology & Inspection process? Get a complete equipment list.
Open the fab equipment planner →