Waferpedia

Comparison ledger

1305 BSG 3versusNS 300 + Wafer

Hitachi 1305 BSG 3, Tokyo Electron NS 300 + Wafer, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
1305 BSG 3Hitachi
NS 300 + WaferTokyo Electron
OEMHitachiTokyo Electron
CategoryWet Processing / CleanWet Processing / Clean
Wafer size—8"
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyHitachi 1305 BSG 3Tokyo Electron NS 300
Cited variants—
Specifications
Configuration—8 chambers[1]
Wafer size—8" wafer[1]
Phase—1 phase[1]
Chemicals—TMY[1]
FOUP—4[1]
Power supply—Tel NSPB-E075-Y[1]
Process Type—Wet process[1]
Wafer Size—8 inch[1]
Number of Chambers—8[1]
FOUP Capacity—4[1]
Power Supply Model—Tel NSPB-E075-Y[1]
Phase (NS 300+)—1 phase[1]
Phase (NS 300)—3 phase[3]
Frequency (NS 300)—50/60Hz[3]
OEM—Tokyo Electron[1]
Model—NS 300 +[1]
Tool type—Wafer Scrubber[1]
Chambers—8 chambers[1]

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Sources (3)Every fact above is drawn from these public sources
  1. [1]Equipment inventory listing
  2. [2]inventory listing
  3. [3]inventory listing