Waferpedia

Comparison ledger

1305 BSG 3versusMark 7

Hitachi 1305 BSG 3, Tokyo Electron Mark 7, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
1305 BSG 3Hitachi
Mark 7Tokyo Electron
OEMHitachiTokyo Electron
CategoryWet Processing / CleanWet Processing / Clean
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyHitachi 1305 BSG 3Tokyo Electron Mark
Cited variants—
  • Mark 7 Coater / Developer[1]
Specifications
Configuration—1C2D[2]
Wafer size range—5 inch to 8 inch[3]
Wafer transport—Vacuumless robotic transport[3]
Chuck types—Mechanical and vacuum chucks for top and back side cleaning[3]
Brush control—Automatic brush pressure controller[3]
Optional cleaning—Jet or megasonic cleaning[3]
Host communication—GEM host communication[3]
Interface—SMIF interface[3]
Compliance—S2-93 and CE mark[3]
Vintage—2011
Coaters & Developers Vintage—2011

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Sources (3)Every fact above is drawn from these public sources
  1. [1]Equipment inventory listing
  2. [2]inventory listing
  3. [3]web.archive.orgweb.archive.org