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Comparison ledger

1305 BSG 3versusSU 3200 Single Wafer

Hitachi 1305 BSG 3, SCREEN SU 3200 Single Wafer, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
1305 BSG 3Hitachi
OEMHitachiSCREEN
CategoryWet Processing / CleanWet Processing / Clean
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyHitachi 1305 BSG 3SCREEN SU 3200 Single Wafer
Specifications
Type—single-wafer cleaner[1]
Wafer size—12 inch[2]
Expandable chambers—up to 12 chambers[1]
Throughput—up to 800 wafers per hour[1]
Process compatibility—compatible with processes for 28 nm node and lower[3]
Make—SCREEN / DNS[2]
Model—SU 3200[2]
Tool type—Single Wafer Cleaner[1]
Maximum throughput—up to 800 wafers per hour[1]
Maximum chambers—up to 12 chambers[1]
Chamber arrangement—12 chambers in four three-level towers[1]
Chemical supply system—dynamic direct injection (DDI) or cabinet-type chemical supply system[1]
Communication protocol—SECS/GEMS[4]
Wafer handler—Kawasaki robot[4]
System power rating—208AC-3 Phase[4]
Software version—P2485STD00V2485STD00[4]

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Sources (4)Every fact above is drawn from these public sources
  1. [1]screen.co.jpscreen.co.jp
  2. [2]Equipment inventory listing
  3. [3]nanoindustry.sunanoindustry.su
  4. [4]waferpedia.comwaferpedia.com