Comparison ledger
GCA AS200, Nikon NSR 2205 i 14 E 2 i-Line, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | AS200GCA | |
|---|---|---|
| OEM | GCA | Nikon |
| Category | Lithography | Lithography |
| Wafer size | 200mm | 200mm |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | i-line | — |
| Family | GCA AS200 | Nikon NSR 2205 |
| Cited variants | — |
|
| Specifications | ||
| Model | AS200[2] | NSR 2205 i 14 E 2[4] |
| OEM | GCA[2] | — |
| Machine name | AutoStep 200 DSW i-line Wafer Stepper[2] | — |
| Reduction | 5X[2] | — |
| Maximum wafer size | up to 200 mm wafers[2] | — |
| Wafer stage | 200 mm Wafer Stage[2] | — |
| Optics NA | 0.45 N.A.[2] | — |
| Lens | Tropel i-line Lens[2] | — |
| Exposure field | 15 mm[2] | — |
| Alignment | uDFAS Die-by-Die Alignment[2] | — |
| Illumination | Annular and Quadrupole illumination available[2] | — |
| Feature size specification | 0.65 µm features[2] | — |
| Overlay specification | <0.125 µm using local alignment[2] | — |
| Focus repeatability | <0.2 µm[2] | — |
| Automation | All operations are automated, including wafer loading, aligning, reticle loading and aligning[2] | — |
| Wafer leveling | Used to provide optimum focus range[2] | — |
| Automatic calibrations | All tool calibrations are performed automatically[2] | — |
| Focus compensation | Compensated for lens heating and barometric shifts[2] | — |
| Reticle management | Reticle Management System (up to 10 reticles)[2] | — |
| Reduction factor | 5X[2] | — |
| Exposure wavelength | i-line[3] | — |
| Lens numerical aperture | 0.45[2] | — |
| Lens type | Tropel i-line lens[2] | — |
| Exposure field size | 15mm[2] | 22mm square to 17.9 (H) x 25.2 (V)mm[8] |
| Feature resolution specification | 0.65µm[2] | — |
| Sigma (partial coherence) | 0.5[2] | — |
| Wafer handling | Automatic wafer handler (set for 100mm wafers)[2] | — |
| Wafer stage size | 200mm Wafer Stage[2] | — |
| Reticle capacity | up to 10 reticles[2] | — |
| Reticle size | 5 inch[2] | — |
| Illumination modes | Annular and Quadrupole illumination available[2] | — |
| Focus system repeatability | <0.2µm[2] | — |
| Configuration | — | Asahi N 4 A-C Chamber:[4] |
| Chamber | — | 21.1℃[4] |
| LLTC | — | 23℃[4] |
| MCSV Version | — | 3.46 C[4] |
| Resolution | — | 0.35μm or better[8] |
| N.A. | — | 0.63 Exposure light source: i line[8] |
| Reduction ratio | — | 1:5[8] |
| Alignment accuracy (EGA, |x|+3σ) | — | 40nm or better[8] |
| Alignment system | — | LSA(standard), FIA(standard), LIA(optional)[8] |
| Wafer size | — | Throughput ≧ 103 wafers/hour (200 mm wafer)[8] |
| Magnification | — | 1/5 Reduction[8] |
| Light-Source | — | i-Line(365nm)[9] |
| Make | — | Nikon[4] |
| Set Temperature | — | -[4] |
| Chamber Temperature | — | 21.1°C[4] |
| Computer Type | — | Alpha Station, HP Alpha Server DS 15 A, Smart Modular Technology ETM 25 SA, Nikon Nest[4] |
| Vintage | — | 2006 (unit 137809), 2001 (unit 137808), 2008 (unit 137807), 2001 (unit 137806), 2001 (unit 137805)[4] |
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