Comparison ledger
EV Group 101, Raith EBPG5150, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 101EV Group | EBPG5150Raith |
|---|---|---|
| OEM | EV Group | Raith |
| Category | Lithography | Lithography |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | EV Group 101 | Raith EBPG5150 |
| Cited variants | — | |
| Specifications | ||
| OEM | EV Group[2] | — |
| Model | 101[2] | — |
| Equipment name | EVG 101 Spray Coater[2] | — |
| NEMO ID | evgspraycoat[2] | — |
| Training required | EVG 101 Training[2] | — |
| Training duration | 1.50 hours[2] | — |
| Processing technique | Resist Spray Coat (manual)[2] | — |
| Cleanliness | "All"[2] | — |
| Location | SNF Paul G Allen L107 Cleanroom[2] | — |
| Wafer diameter (substrate size) | up to 300 mm[3] | — |
| Available modules | Spin coat / OmniSpray® / develop[3] | — |
| Wafer handling options | Bowed / warped / thin wafer handling, edge handling[3] | — |
| Dispense options | Various resist dispense pumps covering viscosities up to 52000 cP; constant pressure dispense systems; EBR / BSR / pre-wet / bowl wash / liquid priming[3] | — |
| Processing technique (at SNF) | Resist Spray Coat (manual)[4] | — |
| Cleanliness group (at SNF) | "All"[2] | — |
| product family | — | Electron Beam Lithography[5] |
| system line | — | EBPG[1] |
| description | — | Highest throughput, automation, and precision[1] |
| column technology | — | Robust 100 kV column technology[1] |
| lithography resolution | — | below 5 nm[1] |
| exposure capability | — | Automated wafer and multi-sample exposures[1] |
| beam current | — | up to 350 nA[1] |
| overlay accuracy | — | ≤ 5 nm[1] |
| stitching accuracy | — | ≤ 8 nm[1] |
| stage size | — | same 6-inch laser stage (155 mm travel range)[1] |
| laser interferometer resolution | — | 10 λ/1024 (0.6 nm) standard[1] |
| thermo-calibration system | — | standard[1] |
| positional drift | — | < 25 nm / h[1] |
| control software | — | Digital RAITH Beams[1] |
| Product line | — | EBPG[5] |
| Technology | — | Electron beam lithography[5] |
| Stage | — | 6-inch laser stage[1] |
| Stage travel range | — | 155 mm[1] |
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