Comparison ledger
EV Group 101, Nikon S 306 C, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 101EV Group | S 306 CNikon |
|---|---|---|
| OEM | EV Group | Nikon |
| Category | Lithography | Lithography |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | 2002 orders accepted |
| Control system | — | — |
| Generation | — | — |
| Family | EV Group 101 | Nikon S 306 C |
| Specifications | ||
| OEM | EV Group[1] | — |
| Model | 101[1] | S 306 C[4] |
| Equipment name | EVG 101 Spray Coater[1] | — |
| NEMO ID | evgspraycoat[1] | — |
| Training required | EVG 101 Training[1] | — |
| Training duration | 1.50 hours[1] | — |
| Processing technique | Resist Spray Coat (manual)[1] | — |
| Cleanliness | "All"[1] | — |
| Location | SNF Paul G Allen L107 Cleanroom[1] | — |
| Wafer diameter (substrate size) | up to 300 mm[2] | — |
| Available modules | Spin coat / OmniSpray® / develop[2] | — |
| Wafer handling options | Bowed / warped / thin wafer handling, edge handling[2] | — |
| Dispense options | Various resist dispense pumps covering viscosities up to 52000 cP; constant pressure dispense systems; EBR / BSR / pre-wet / bowl wash / liquid priming[2] | — |
| Processing technique (at SNF) | Resist Spray Coat (manual)[3] | — |
| Cleanliness group (at SNF) | "All"[1] | — |
| Arf Wavelength | — | 193 nm[4] |
| Configuration | — | Resolution ≤ 100 nm[5] |
| Reduction magnification 1 | — | 4[5] |
| Resolution | — | ≤ 100 nm (with SHRINC)[5] |
| Resolution (without SHRINC) | — | 120 nm[6] |
| Numerical Aperture (NA) | — | 0.78[5] |
| Exposure source | — | ArF excimer laser (193 nm)[5] |
| Reduction magnification | — | 1:4[5] |
| Maximum exposure range | — | 25 × 33 mm[5] |
| Overlap accuracy (EGA, |M| + 3σ) | — | ≤ 20 nm[5] |
| Alignment accuracy (three-sigma) | — | better than 23 nm[6] |
| Throughput | — | 135 – 200 wafers per hour (200 mm) / over 85 wafers per hour (300 mm)[6] |
| Wafer size | — | 8 inch (200 mm) and 300 mm[4] |
| Type | — | Scanner[4] |
| Make | — | Nikon[4] |
| NA | — | 0.78[5] |
| Alignment accuracy | — | better than 23 nm[6] |
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