Waferpedia

Comparison ledger

Integrity-29versusIntegrity-36

Denton Vacuum Integrity-29, Denton Vacuum Integrity-36, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
Integrity-29Denton Vacuum
Integrity-36Denton Vacuum
OEMDenton VacuumDenton Vacuum
CategoryOphthalmic coating systemOphthalmic coating system
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system—Windows NT
Generation——
FamilyDenton Vacuum Integrity-29Denton Vacuum Integrity-36
Specifications
Vacuum chamber material304 stainless steel[1]304 stainless steel[2]
Vacuum chamber dimensions29 in wide x 29 in deep x 32 in high[1]36" wide x 36" deep x 42" high[2]
Vacuum chamber doorFull-width front door with two-point articulating hinges and Viton O-ring seal[1]Full-width front door with two-point articulating hinges and Viton O-ring seal[2]
System cabinetsTwo stand-alone NEMA 12 enclosures[1]—
Pumping systemAPD-10SC cryogenic pump with APD Displex water-cooled compressor and Alcatel 2063 two-stage rotary vane mechanical pump[1]APD Cryogenics Marathon 12 cryogenic pump, APD Displex water-cooled compressor, Edwards E2M175 two-stage rotary vane mechanical pump, and Polycold PFC330ST cryogenic cooler[2]
Additional vacuum coolingPolycold PFC330ST cryogenic cooler[1]—
Vacuum gauging controllerGranville-Phillips GP307 ionization/convectron gauge controller[1]—
Process gas controlTwo MKS 2179 mass flow controllers, each capable of 0-100 sccm in fixed flow mode[1]MKS 2179 mass flow controller, 0-100 SCCM in fixed flow mode[2]
Substrate rotationDirect drive, single rotation fixture with bearing-supported feedthrough and 1.0 in diameter shaft[1]Standard direct drive single rotation system with 1.0" diameter shaft[2]
Substrate heaterOne 3 kW radiant quartz heater assembly[1]—
Ion sourceDenton Vacuum CC-105 cold cathode ion source[1]DVI CC-105 cold cathode ion source with Senvac GD20/600 and Sorensen DCS 33-33 power supplies[2]
Electron beam evaporation sourceTFI-Telemark TFI-261-06 six-pocket rotary crucible electron beam source[1]—
Electron beam power supplyTFI-Telemark ST-4 4.0 kW electron beam gun power supply[1]—
Low voltage resistance source power supplyDenton Vacuum 4.0 kW two-position A/B low voltage resistance evaporation power supply[1]—
Deposition controllerInficon XTC/2 quartz crystal controller with single crystal sensor[1]Inficon XTC/2 quartz crystal controller with single crystal sensor[2]
System computerHewlett Packard Vectra PC with 586 microprocessor and 17 in SVGA monitor[1]—
Control software interfaceGE Cimplicity software via RS-485 interface to a GE Fanuc 9030 PLC[1]—
Vacuum gauging—Two Leybold Inficon ITR100 wide-range Bayard-Alpert ionization gauge tubes and two Leybold Inficon TTR211S Pirani transmitters[2]
Substrate heaters—Two 3 kW radiant quartz heater assemblies[2]
Electron beam source—TFI-Telemark TFI-261-06 six-pocket rotary crucible source with ST-4 4.0 kW power supply[2]
Low voltage resistance source—Denton Vacuum 4.0 kW two-position A/B low voltage resistance evaporation power supply[2]
Control system—Gateway computer with 17" SVGA monitor, IEEE-488 and RS-232 interfaces, and GE Fanuc 9030 PLC via RS-485 using GE Cimplicity HMI software[2]
Control modes—Automatic, Manual, and Service[2]

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Sources (2)Every fact above is drawn from these public sources
  1. [1]web.archive.orgweb.archive.org
  2. [2]web.archive.orgweb.archive.org