Comparison ledger
Coherent Waferlase ID 200 Dry, Oxford Instruments 100 ICP Fluorine, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | Waferlase ID 200 DryCoherent | 100 ICP FluorineOxford Instruments |
|---|---|---|
| OEM | Coherent | Oxford Instruments |
| Category | Etch | Etch |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Coherent Waferlase ID 200 Dry | Oxford Instruments 100 ICP Fluorine |
| Specifications | ||
| Gas | no chemicals, class 4 laser[1] | — |
| OS | Windows 10[1] | — |
| Note | quality issues[1] | — |
| Etch Gases | — | SF6, CF4, O2, Ar, N2, CHF3, C4F8[2] |
| Cryo DRIE etch rate | — | up to 5 µm/min[2] |
| Wafer size | — | 4 inch, 6 inch, 8 inch (with clamp change)[2] |
Plan your fab
Building a Etch process? Get a complete equipment list.
Open the fab equipment planner →