Waferpedia

Comparison ledger

1000 Hot PlateversusFormula Diffusion

CEE 1000 Hot Plate, Tokyo Electron Formula Diffusion, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
Formula DiffusionTokyo Electron
OEMCEETokyo Electron
CategoryThermal / DiffusionThermal / Diffusion
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones—2003 Manufacture vintage
Control system——
Generation——
FamilyCEE 1000 Hot PlateTokyo Electron Formula Diffusion
Cited variants—
  • Formula Diffusion Furnace Aluminium Oxide Process[1]
Specifications
Configuration4"[2]—
TypeHot Plate[2]—
Wafer Size4 inch[2]—
Wafer size—300 mm[1]
Process—Aluminium oxide diffusion[1]

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Sources (2)Every fact above is drawn from these public sources
  1. [1]fabsurplus.comfabsurplus.com
  2. [2]inventory listing