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Comparison ledger

1000 Hot PlateversusAlpha 8 S

CEE 1000 Hot Plate, Tokyo Electron Alpha 8 S, side by side. Every value shown is drawn from the cited encyclopedia entries.

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Side-by-side comparison of selected equipment models
Attribute
1000 Hot PlateCEE
Alpha 8 STokyo Electron
OEMCEETokyo Electron
CategoryThermal / DiffusionThermal / Diffusion
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyCEE 1000 Hot PlateTokyo Electron Alpha
Cited variants—
  • BBR3 DOPE[1]
  • WELL DRIVE HT FIELD OX[2]
  • D2 ANNEAL[3]
  • DENSIFICATION[4]
  • FSG ANNEAL[5]
Specifications
Configuration4"[6]BBR3 DOPE[1]
TypeHot Plate[6]—
Wafer Size4 inch[6]8 inch[1]
Process—POCL3[9]
Vintage—1999
Furnaces / Diffusion Vintage—1999
1000 Hot Plate entryAlpha 8 S entryAsk about these tools →Share experience with this comparison →

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Sources (9)Every fact above is drawn from these public sources
  1. [1]Equipment inventory listing
  2. [2]Equipment inventory listing
  3. [3]Equipment inventory listing
  4. [4]Equipment inventory listing
  5. [5]Equipment inventory listing
  6. [6]inventory listing
  7. [7]inventory listing
  8. [8]inventory listing
  9. [9]inventory listing