Comparison ledger
CEE 100, SUSS MicroTec DSC500, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 100CEE | DSC500SUSS MicroTec |
|---|---|---|
| OEM | CEE | SUSS MicroTec |
| Category | Lithography | Lithography |
| Wafer size | 6" | 450 x 500 mm |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | CEE 100 | SUSS MicroTec DSC500 |
| Cited variants |
| — |
| Specifications | ||
| Tool type | Spray Developer[1] | — |
| Accepts wafer size | up to 6" wafers[2] | — |
| Programmable programs | 10 programs[2] | — |
| Steps per program | up to 10 steps[2] | — |
| Programmable step parameters | Acceleration, Speed, Time[2] | — |
| Associated document | CEE Model 100CB Spinner.doc[2] | — |
| Wafer size | Up to 6 inches[2] | — |
| Programs | 10 programs each with up to 10 steps[2] | — |
| Control parameters | Acceleration, Speed, Time[2] | — |
| Substrate size | — | up to 450 x 500 mm[3] |
| Type | — | Projection Lithography[3] |
| Automation | — | Automated system[3] |
| Exposure method | — | Full-Field Scanning Projection[3] |
| Alignment | — | Included[3] |
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