Comparison ledger
Canon MPA 600 FA Mirror Projection Mask, SUSS MicroTec 150 e Mask, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 150 e MaskSUSS MicroTec | |
|---|---|---|
| OEM | Canon | SUSS MicroTec |
| Category | Lithography | Lithography |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Canon MPA 600 | SUSS MicroTec 150 e Mask |
| Specifications | ||
| Configuration | With:[1] | — |
| OEM | Canon[1] | — |
| Model | MPA 600 FA[1] | — |
| Equipment type | Mirror Projection Mask Aligner[1] | — |
| Wafer sizes | 6 inch[1] | — |
| Vintage | 1988[1] | — |
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