Waferpedia

Comparison ledger

FPA 6000 ES 6 a KrFversus1000 Family

Canon FPA 6000 ES 6 a KrF, Ultratech 1000 Family, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
1000 FamilyUltratech
OEMCanonUltratech
CategoryLithographyLithography
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyCanon FPA 6000Ultratech 1000 Family
Specifications
Configuration90nm[1]—
ManufacturerCanon[1]—
ModelFPA 6000 ES 6 a[1]—
TypeKrF Scanner[1]—
Resolution / Node90nm[2]—
Wafer Size12 inch (300mm)[2]—
Laser SourceCymer ELS-7310[2]—
Reticle Size6 inch[2]—
Reticle ConfigurationInline (R->L)[2]—
Uniformity1.811%[2]—
Intensity24299.68 W/m²[2]—
MakeCanon[1]—
Equipment typeKrF Scanner[1]—
Process node90nm[2]—
Wafer size12 inch[2]—
Reticle6 inch reticle inline (R->L)[2]—
Laser sourceCymer Laser (ELS-7310)[2]—
Tool type—Photolithography step-and-repeat 1X stepper[3]
Optical design—Wynne Dyson[3]
Magnification—1X[3]

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Sources (3)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]inventory listing
  3. [3]en.wikipedia.orgen.wikipedia.org