Canon
FPA 5510 iZ i-Line alternatives
Comparable Lithography equipment documented in the Waferpedia catalog.
6 comparable tools
Nikon
NSR SF 155 i-Line
Lithography
The Nikon NSR SF 155 is an i-line stepper with a 12-inch wafer size.
Nikon
SF 130
Lithography
The Nikon SF 130 is a lithography stepper with an i-line 365 nm exposure wavelength and support for 200 mm wafer exposure.
Brooks
017-0024-01 Prealigner
Lithography
Brooks
017-0146-01 Prealigner
Lithography
Brooks 017-0146-01 is a prealigner manufactured by Brooks.
Ultratech
1000 Family
Lithography
EV Group
101
Lithography
The EVG 101 is an advanced resist processing system for spin or spray coating and developing of wafers up to 300 mm.
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