Waferpedia

Comparison ledger

FPA 3000 i 5versus101

Canon FPA 3000 i 5, EV Group 101, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
101EV Group
OEMCanonEV Group
CategoryLithographyLithography
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyCanon FPA 3000EV Group 101
Cited variants
  • FPA 3000 i 5 +[1]
—
Specifications
WaferNotch[1]—
TransferL Type[1]—
Reticle cassetteCanon's[1]—
Reticle additional libraryno[1]—
PPC unitno[1]—
Software VersionV13.06B.06[1]—
ConfigurationRasco TBW-CD-83 + Compact Chamber[2]—
Wafer Size8 inch[1]—
Wafer AlignmentNotch[1]—
Transfer TypeL Type[1]—
Additional Reticle LibraryNo[1]—
Included Transfer ModuleRasco TBW-CD-83 + Compact Chamber (2000 Vintage)[2]—
Additional AccessoriesRasco TBW-CD-83 + Compact Chamber 2000 Vintage[2]—
ManufacturerCanon[3]—
ModelFPA 3000 i 5[3]101[4]
Equipment typeStepper[3]—
OEM—EV Group[4]
Equipment name—EVG 101 Spray Coater[4]
NEMO ID—evgspraycoat[4]
Training required—EVG 101 Training[4]
Training duration—1.50 hours[4]
Processing technique—Resist Spray Coat (manual)[4]
Cleanliness—"All"[4]
Location—SNF Paul G Allen L107 Cleanroom[4]
Wafer diameter (substrate size)—up to 300 mm[5]
Available modules—Spin coat / OmniSpray® / develop[5]
Wafer handling options—Bowed / warped / thin wafer handling, edge handling[5]
Dispense options—Various resist dispense pumps covering viscosities up to 52000 cP; constant pressure dispense systems; EBR / BSR / pre-wet / bowl wash / liquid priming[5]
Processing technique (at SNF)—Resist Spray Coat (manual)[6]
Cleanliness group (at SNF)—"All"[4]

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Sources (6)Every fact above is drawn from these public sources
  1. [1]Equipment inventory listing
  2. [2]inventory listing
  3. [3]Equipment inventory listing
  4. [4]snfguide.stanford.edusnfguide.stanford.edu
  5. [5]evgroup.comevgroup.com
  6. [6]snfguide.stanford.edusnfguide.stanford.edu