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Comparison ledger

FPA 2500 i 3 Fine Patternversus101

Canon FPA 2500 i 3 Fine Pattern, EV Group 101, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
101EV Group
OEMCanonEV Group
CategoryLithographyLithography
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyCanon FPA 2500 i 3 Fine PatternEV Group 101
Specifications
Vintage1994[1]—
CategoryLithography[2]—
OEM—EV Group[3]
Model—101[3]
Equipment name—EVG 101 Spray Coater[3]
NEMO ID—evgspraycoat[3]
Training required—EVG 101 Training[3]
Training duration—1.50 hours[3]
Processing technique—Resist Spray Coat (manual)[3]
Cleanliness—"All"[3]
Location—SNF Paul G Allen L107 Cleanroom[3]
Wafer diameter (substrate size)—up to 300 mm[4]
Available modules—Spin coat / OmniSpray® / develop[4]
Wafer handling options—Bowed / warped / thin wafer handling, edge handling[4]
Dispense options—Various resist dispense pumps covering viscosities up to 52000 cP; constant pressure dispense systems; EBR / BSR / pre-wet / bowl wash / liquid priming[4]
Processing technique (at SNF)—Resist Spray Coat (manual)[5]
Cleanliness group (at SNF)—"All"[3]

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Sources (5)Every fact above is drawn from these public sources
  1. [1]Equipment inventory listing
  2. [2]waferpedia.comwaferpedia.com
  3. [3]snfguide.stanford.edusnfguide.stanford.edu
  4. [4]evgroup.comevgroup.com
  5. [5]snfguide.stanford.edusnfguide.stanford.edu