Comparison ledger
Bruker InSight 3 DAFM Photomask Atomic Force, KLA 1.112 PSL Wafer, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | ||
|---|---|---|
| OEM | Bruker | KLA |
| Category | Metrology & Inspection | Metrology & Inspection |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Bruker InSight 3 DAFM Photomask Atomic Force | KLA 1.112 PSL Wafer |
| Specifications | ||
| Configuration | CD performance:[1] | NIST Traceable[3] |
| Static accuracy | 3σ (%) < 1.1%[1] | — |
| Dynamic accuracy | 1.2nm (3σ)[1] | — |
| Throughput (9 sites) | 14 wph[1] | — |
| Max scan size | 49X49μm[1] | — |
| Noise | 0.1nm RMS[1] | — |
| Phase | 1 Phase[2] | — |
| CD Static Accuracy (3σ) | < 1.1%[1] | — |
| CD Dynamic Accuracy (3σ) | 1.2 nm[1] | — |
| Minimum Pattern Spacing (CD, dense) | 40 nm[1] | — |
| Depth Static Accuracy (3σ) | < 0.4%[1] | — |
| Depth Dynamic Accuracy (3σ) | 0.5 nm[1] | — |
| Minimum Pattern Spacing (Depth, dense) | 30 nm[1] | — |
| Maximum Scan Size | 49×49 μm[1] | — |
| Power Phase | 1 Phase[2] | — |
| Power Wire | 3 Wire[2] | — |
| Power Frequency | 50/60 Hz[2] | — |
| Power Voltage | 208-230 V[2] | — |
| Peak kVA | 2.8[2] | — |
| Average kVA | 2.0[2] | — |
| Wafer Size | — | 8 inch[3] |
| NIST Traceable | — | True[3] |
| Compatible Tools | — | Surfscan 6xy0 and Sp1[4] |
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