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Comparison ledger

017-0146-01 PrealignerversusMA/BA6

Brooks 017-0146-01 Prealigner, SUSS MicroTec MA/BA6, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
MA/BA6SUSS MicroTec
OEMBrooksSUSS MicroTec
CategoryLithographyLithography
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyBrooks 017-0146-01 PrealignerSUSS MicroTec MA/BA6
Cited variants—
  • MA/BA6 Gen4[1]
  • SUSS MicroTec MA/BA6 Gen4 Mask Aligner[2]
Specifications
Type—Contact aligner[3]
Application—Broadband lithography[3]
Alignment capability—Backside alignment capability[3]
Exposure wavelengths—g-line (436 nm), h-line (405 nm), i-line (365 nm), UV broadband (350-450 nm)[1]
Illumination area—150 mm diameter[1]
Resolution (standard)—1 µm[1]
Resolution (best)—0.6 µm in vacuum contact mode[2]
Topside overlay accuracy—500 nm[1]
Backside overlay accuracy—1000 nm[1]
Maximum wafer diameter—150 mm (6 in)[1]
Substrate sizes—1" to 150 mm diameter[4]
Mask sizes—2.5" x 2.5" to 7" x 7"[4]
Maximum substrate thickness—10 mm[4]
Lamp—350 W mercury lamp[2]
Exposure modes—vacuum contact, hard contact, soft contact[2]
i-line band pass filter—removable[2]
Alignment accuracy—0.25 - 0.5 µm[2]
Backside alignment—Yes[3]
Tool type—Contact aligner[3]
Alignment modes—Frontside and backside alignment[1]
Resolution—1 µm[1]
Top side overlay accuracy—500 nm[1]
Mask sizes supported—127 mm x 127 mm (5 in.) and 178 mm x 178 mm (7 in.)[1]
Substrate thickness—10 mm maximum substrate thickness[4]
Feature size—Down to 0.6 µm[2]
Exposure area—6 in. diameter exposure area[2]
Light source—350 W mercury lamp[2]

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Sources (4)Every fact above is drawn from these public sources
  1. [1]nist.govnist.gov
  2. [2]imseam.uni-heidelberg.deimseam.uni-heidelberg.de
  3. [3]cnsi.ucsb.educnsi.ucsb.edu
  4. [4]nff.gmu.edunff.gmu.edu