Waferpedia

Comparison ledger

017-0146-01 PrealignerversusHL 8000 M E-Beam Lithography

Brooks 017-0146-01 Prealigner, Hitachi HL 8000 M E-Beam Lithography, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
OEMBrooksHitachi
CategoryLithographyLithography
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyBrooks 017-0146-01 PrealignerHitachi HL 8000 M E-Beam Lithography
Specifications
Configuration—6" reticle mask line[1]
Manufacturer—Hitachi[1]
Model—HL 8000 M[1]
Optics & imaging—6" reticle mask line[2]

Plan your fab

Building a Lithography process? Get a complete equipment list.

Open the fab equipment planner →
Sources (2)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]waferpedia.comwaferpedia.com