Comparison ledger
Axcelis 200 ACU, Oxford Instruments Plasmalab 100 Plus RIE, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 200 ACUAxcelis | Plasmalab 100 Plus RIEOxford Instruments |
|---|---|---|
| OEM | Axcelis | Oxford Instruments |
| Category | Etch | Etch |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Axcelis NV GSD 200 | Oxford Instruments Plasmalab 100 |
| Specifications | ||
| Configuration | Parts Machine[1] | Load-locked System[5] |
| Manufacturer | Axcelis[1] | — |
| Model | 200 ACU[1] | — |
| Tool type | Asher[1] | Reactive ion etcher[5] |
| Wafer size | 200mm[3] | — |
| Serial number | AU6A356AH[3] | — |
| Computer system | M 200 PC, M 200[4] | — |
| Part number | SC 4572 A[4] | — |
| Volts | 208[4] | — |
| Amps | 30[4] | — |
| Equipment type | Asher[1] | — |
| Wafer configuration | 8 inch[2] | — |
| Category | — | Etch[6] |
| Wafer sizes | — | 2, 3, 4, 5, 6, 8, 12 inch[5] |
| System configuration | — | Load-locked system[5] |
| Gas module | — | Currently set up for Ar, O2, Cl2, and SiCl4; capable of 6 gases[5] |
| Included items | — | Computer, keyboard, new flat panel monitor, system chiller, turbo pump, load lock pump, operations manual and documentation[5] |
| Condition | — | Fully refurbished and meeting original specifications[5] |
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