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Comparison ledger

200 ACUversusSEZ SP 203 Spin

Axcelis 200 ACU, Lam Research SEZ SP 203 Spin, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
200 ACUAxcelis
SEZ SP 203 SpinLam Research
OEMAxcelisLam Research
CategoryEtchEtch
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyAxcelis NV GSD 200Lam Research SEZ SP 203
Specifications
ConfigurationParts Machine[1]50/60 Hz[5]
ManufacturerAxcelis[1]—
Model200 ACU[1]SEZ SP 203 Spin[5]
Tool typeAsher[1]Spin etcher[7]
Wafer size200mm[3]150mm[8]
Serial numberAU6A356AH[3]—
Computer systemM 200 PC, M 200[4]—
Part numberSC 4572 A[4]—
Volts208[4]—
Amps30[4]—
Equipment typeAsher[1]—
Wafer configuration8 inch[2]—
Voltage—400 VAC[5]
Max. Current—32 A[5]
Breaking Capacity—10.000 AIC[5]
Power—400V, 50 Hz, 3-Phase[6]
Phase—ENI VL-400 Phase Shift Controller[6]
Roughing Pump Code—A532-80-905[6]
OEM—Lam Research[7]
Category—Etch[7]
Vintage—1999[8]
Process pump status—Process pump in one chemical cabinet (sub tool) has malfunction[5]

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Sources (8)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]semistarcorp.comsemistarcorp.com
  3. [3]wotol.comwotol.com
  4. [4]semistarcorp.comsemistarcorp.com
  5. [5]inventory listing
  6. [6]inventory listing
  7. [7]waferpedia.comwaferpedia.com
  8. [8]csisemi.comcsisemi.com