Waferpedia

Comparison ledger

200 ACUversus590

Axcelis 200 ACU, Lam Research 590, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
200 ACUAxcelis
590Lam Research
OEMAxcelisLam Research
CategoryEtchEtch
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyAxcelis NV GSD 200Lam Research 590
Specifications
ConfigurationParts Machine[1]—
ManufacturerAxcelis[1]—
Model200 ACU[1]590[5]
Tool typeAsher[1]—
Wafer size200mm[3]6 inch[5]
Serial numberAU6A356AH[3]—
Computer systemM 200 PC, M 200[4]—
Part numberSC 4572 A[4]—
Volts208[4]—
Amps30[4]—
Equipment typeAsher[1]—
Wafer configuration8 inch[2]—
Voltage—208V[5]
RF frequency—13.56 MHz[7]
Pressure—2.8 Torr[7]
Gap—0.38 cm[7]
Power (low)—450 W[7]
Power (high)—850 W[7]
OEM—Lam Research[5]
Category—Etcher[5]
Power—208V[5]
Plasma recipe entry—CF4+CHF3+He (90:30:120 sccm)[7]

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Sources (7)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]semistarcorp.comsemistarcorp.com
  3. [3]wotol.comwotol.com
  4. [4]semistarcorp.comsemistarcorp.com
  5. [5]inventory listing
  6. [6]inventory listing
  7. [7]nanocenter.umd.edunanocenter.umd.edu