Comparison ledger
Axcelis 200 ACU, Lam Research 2300 V 2 Kiyo 45, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 200 ACUAxcelis | 2300 V 2 Kiyo 45Lam Research |
|---|---|---|
| OEM | Axcelis | Lam Research |
| Category | Etch | Etch |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Axcelis NV GSD 200 | Lam Research 2300 |
| Cited variants | — |
|
| Specifications | ||
| Configuration | Parts Machine[4] | Polysilicon[1] |
| Manufacturer | Axcelis[4] | — |
| Model | 200 ACU[4] | 2300 V 2 Kiyo 45[8] |
| Tool type | Asher[4] | — |
| Wafer size | 200mm[6] | — |
| Serial number | AU6A356AH[6] | — |
| Computer system | M 200 PC, M 200[7] | — |
| Part number | SC 4572 A[7] | — |
| Volts | 208[7] | — |
| Amps | 30[7] | — |
| Equipment type | Asher[4] | — |
| Wafer configuration | 8 inch[5] | — |
| Process capability | — | Polysilicon[1] |
| Chamber configuration | — | 4ch (4-channel)[1] |
| Process gases | — | SiCl4, BCl3, HBr, CH4, CHF3, Cl2, CH2F2, CH3F, NF3, O2, CF4, He, Ar, N2[1] |
| Vacuum pump | — | Edwards STP XA2703CV[1] |
| Make | — | Lam[8] |
| Category | — | Etcher[8] |
| Process | — | Polysilicon etching[1] |
| Number of Chambers | — | 4ch[1] |
| Gas Chemistry | — | SiCl4 / BCl3 / HBr / CH4 / CHF3 / Cl2 / CH2F2 / CH3F / NF3 / O2 / CF4 / He / Ar / N2[1] |
| Pump | — | Edwards STP XA2703CV[1] |
| Number of chambers | — | 4[1] |
| Process chambers | — | 4[1] |
| Process Type | — | Polysilicon[1] |
| Chamber Count | — | 4[1] |
| Supported Gases | — | SiCl4 / BCl3 / HBr / CH4 / CHF3 / Cl2 / CH2F2 / CH3F / NF3 / O2 / CF4 / He / Ar / N2[1] |
| Vintage (some units) | — | 2007, 2008, 2009[2] |
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