Comparison ledger
ASML PAS 5500 300 C, CEE 100, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | PAS 5500 300 CASML | 100CEE |
|---|---|---|
| OEM | ASML | CEE |
| Category | Lithography | Lithography |
| Wafer size | Wafer Alignment: | 6" |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | ASML PAS 5500 | CEE 100 |
| Cited variants |
|
|
| Specifications | ||
| S/W Ver | 8.9.0[3] | — |
| PC Type | LIPC (Linnux PC)[3] | — |
| Disk Drive | 2 disc RAID system[3] | — |
| Configuration | Projection:[3] | — |
| Wafer Stage Type | Air Bearing Exposure Stage 200mm, SiSiC Wafer Table (Can be set up to run 125-200mm wafers)[3] | — |
| Field Size | 31.1mm Diameter, 22x27.4 Field Size[3] | — |
| Reticle Alignment | TTL Dual Beam Alignment[3] | — |
| Wafer size | Wafer Alignment:[3] | Up to 6 inches[4] |
| Model | PAS 5500 / 300 C[3] | — |
| Illumination source | Cymer ELS 5610[3] | — |
| Wavelength | 248 nm[3] | — |
| Wafer alignment | ATHENA+TIS 3X0 (Off Axis Alignment System)[3] | — |
| Projection optics | Zeiss DUV 4X Double Telecentric[3] | — |
| Numerical aperture | 0.57-0.4[3] | — |
| Resolution | <0.25 um[3] | — |
| Levelling/autofocus | Two measurement systems: coarse red measurement system (820 nm) and fine white measurement system (725-1050 nm)[3] | — |
| Wafer loader | SEMI Standard, 2x Cassette Wafer Transport System, 2x Track Interface Ports[3] | — |
| Control rack position | OCU Mark V-LHS[3] | — |
| Reticle loader | ARMS - 3 Reticle Libraries (SMIF Ports)[3] | — |
| Image Sensor | IQC for fast automated verification of Focus and Overlay[3] | — |
| Barcode Reader | yes[3] | — |
| Tool type | — | Spray Developer[2] |
| Accepts wafer size | — | up to 6" wafers[4] |
| Programmable programs | — | 10 programs[4] |
| Steps per program | — | up to 10 steps[4] |
| Programmable step parameters | — | Acceleration, Speed, Time[4] |
| Associated document | — | CEE Model 100CB Spinner.doc[4] |
| Programs | — | 10 programs each with up to 10 steps[4] |
| Control parameters | — | Acceleration, Speed, Time[4] |
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