Applied Materials
VIISta 810 alternatives
Comparable Ion Implantation equipment documented in the Waferpedia catalog.
6 comparable tools
Varian
EHPI 500
Ion Implantation
The Varian EHPi 500 is a medium current ion implanter offering an energy range of 5–260 keV (X+) and capable of handling wafer sizes up to 200 mm for features down to 0.18 µm.
Varian
EHPI E 220
Ion Implantation
The Varian EHPI E 220 is an ion implanter described as an 8-inch, medium-current system with a SMIF interface.
Applied Materials
0010-14300 Magnet Assy
Ion Implantation
Varian
0216 7696, E 11368072 ESC
Ion Implantation
The Varian 0216 7696, E 11368072 ESC is an electrostatic chuck (ESC) platen of the ADV-S type, categorized under ion implantation equipment.
Varian
160 XP
Ion Implantation
The Varian 160 XP is an ion implanter. A variant, the Varian 160 XP Ion, is configured as a 150 mm high-current implanter.
Varian
160 XP Ion
Ion Implantation
The Varian 160 XP Ion is an ion implantation tool configured as a 150mm high-current implanter.
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