Comparison ledger
Applied Materials VIISta 80 High Current, Axcelis 200 PCU, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | VIISta 80 High CurrentApplied Materials | 200 PCUAxcelis |
|---|---|---|
| OEM | Applied Materials | Axcelis |
| Category | Ion Implantation | Ion Implantation |
| Wafer size | Laser Wafer Mapping | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | 2000 Vintage |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials VIISTA | Axcelis NV GSD 200 |
| Cited variants | — | |
| Specifications | ||
| Line Voltage | 3 Phase, 208 V[3] | — |
| Line Frequency | 50 / 60 Hz[3] | — |
| UPS | EATON 9 PX 3000[3] | — |
| Configuration | Chamber A - DPN (Aluminum)[3] | — |
| He MFC Size | Optional[3] | — |
| N 2 MFC Size | 1 slm (for 500 sccm in the recipe)[3] | — |
| Type | UES with Turbo Foreline[3] | — |
| Cassette Stage | 200 mm (8") Standard[3] | — |
| Wafer size | Laser Wafer Mapping[3] | — |
| Lamp Colors | Red, Orange, Green[3] | — |
| Chiller | Affinity RAA 012 K CE 55 CBC[3] | — |
| DI Cart | VIISta 80 with B-Pure Filters[3] | — |
| Manufacturer | Applied Materials / Varian[4] | — |
| Model | VIISta 80[4] | — |
| Wafer Size | 200 mm (8 inch)[3] | — |
| Gas Box | 5 sticks, HP and SDS 2 in use; He MFC optional; N2 MFC 1 slm[3] | — |
| Loadlock / Cassette | 2 chambers, UES with Turbo Foreline; Cassette Stage 200 mm (8") Standard with Laser Wafer Mapping[3] | — |
| Vintage | 2000[3] | — |
| Laser Wafer Mapping | Yes[3] | — |
| Loadlock Chambers | 2, Type UES with Turbo Foreline[3] | — |
| Year of Manufacture | 2000[3] | — |
| SMIF Version | 200 mm SMIF[5] | — |
| Manufacturing Date | 2000-12-01[5] | — |
| P/N | — | SC 4840 A[6] |
| Frequency | — | 50 Hz[6] |
| Phase | — | 3 Phase[6] |
| Voltage | — | 400 V[6] |
Plan your fab
Building a Ion Implantation process? Get a complete equipment list.
Open the fab equipment planner →