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Comparison ledger

Precision Implant xR 200 S High Currentversus200 PCU

Applied Materials Precision Implant xR 200 S High Current, Axcelis 200 PCU, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
200 PCUAxcelis
OEMApplied MaterialsAxcelis
CategoryIon ImplantationIon Implantation
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones—2000 Vintage
Control system——
Generation——
FamilyApplied Materials xR 200 SAxcelis NV GSD 200
Cited variants—
  • Fusion 200 PCU[1]
  • Fusion 200 PCU-P[2]
Specifications
ConfigurationChamber with Liners Turbo Pump (2)[3]—
OEMApplied Materials[3]—
ModelPrecision Implant xR 200 S[3]—
CategoryIon Implantation[4]—
TypeHigh Current Ion Implanter[4]—
Wafer size8 inch[3]—
Vacuum & pumpingChamber with Liners Turbo Pump (2); Leybold Turbo Mech Parts; 8500 Cryo Pump (2); Backing Pumps (3); Cryo Pumps (2); Cryo Compressor Energy Range Acceleration Drift / Accel[4]—
P/N—SC 4840 A[5]
Frequency—50 Hz[5]
Phase—3 Phase[5]
Voltage—400 V[5]

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Sources (5)Every fact above is drawn from these public sources
  1. [1]exapro.comexapro.com
  2. [2]fabsurplus.comfabsurplus.com
  3. [3]inventory listing
  4. [4]waferpedia.comwaferpedia.com
  5. [5]inventory listing