Comparison ledger
Applied Materials PI 9500 Ion, Varian 160 XP, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | PI 9500 IonApplied Materials | 160 XPVarian |
|---|---|---|
| OEM | Applied Materials | Varian |
| Category | Ion Implantation | Ion Implantation |
| Wafer size | Wafer Loader Blade Control PCB | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials PI 9500 | Varian 160 XP |
| Cited variants | — |
|
| Specifications | ||
| Configuration | Belt Drive[2] | — |
| Frequency | 60 Hz[2] | — |
| Utilities | Top feed[2] | — |
| Water fittings | Imperial[2] | — |
| Remote distance | 6m umbilical[2] | — |
| Layout | Thru wall[2] | — |
| Wafer cassette | 26 wafers[2] | — |
| Helium line length | 15 m[2] | — |
| Factory interface | SECS / GEM[2] | — |
| Tilt angle | Variable 0-7 degree[2] | — |
| Plasma Flood System | HDPFS[2] | — |
| Beamline | Standard[2] | — |
| Source type | Bernas[2] | — |
| Front plate | Tungsten[2] | — |
| Extraction type | Single bellows[2] | — |
| Make | Applied Materials[2] | — |
| Model | PI 9500[2] | — |
| Equipment type | Ion Implanter[2] | — |
| Wafer Sizes | 6 inch[2] | — |
| Drive | Belt Drive[2] | — |
| Pumps | Leybold Turbo pumps; Ebara A07V Mech pump; CTI Cryo pump[2] | — |
| Standard wheel | 25 wfr wheel[2] | — |
| Source chamber liners | Included[2] | — |
| MRS Chamber Liners | Included[2] | — |
| Gas position 1 | Boron (gas module missing)[2] | — |
| Gas position 2 | n/a (gas module missing)[2] | — |
| Gas position 3 | Phosphine[2] | — |
| Gas position 4 | Arsine[2] | — |
| Wafer size | Wafer Loader Blade Control PCB[2] | — |
| Configuration (160 XP Ion variant) | — | 150mm High Current IMP[1] |
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