Comparison ledger
Applied Materials Centura 5200 RTP Reactor, CEE 1000 Hot Plate, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | Centura 5200 RTP ReactorApplied Materials | |
|---|---|---|
| OEM | Applied Materials | CEE |
| Category | Thermal / Diffusion | Thermal / Diffusion |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials Centura 5200 RTP Reactor | CEE 1000 Hot Plate |
| Specifications | ||
| Voltage | 208 VAC, 3 Phase[1] | — |
| System Controller | Standard[1] | — |
| Fab installation | TTW[1] | — |
| System Umbilicals | 25 ft[1] | — |
| Loadlock Pump | Ebara[1] | — |
| Pump Size | A30[1] | — |
| I/O Slit Valve Type | Viton[1] | — |
| Gas Panel Purity | UHP[1] | — |
| Gas Panel Type | Standard[1] | — |
| Chambers | 1[1] | — |
| Power | 208 VAC, 3 Phase[1] | — |
| Y2k compliant | Yes[1] | — |
| OTF Certified | Yes[1] | — |
| Configuration | — | 4"[2] |
| Type | — | Hot Plate[2] |
| Wafer Size | — | 4 inch[2] |
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