Comparison ledger
Applied Materials Centura 5200 Metal, Lam Research Concept Two Dual Sequel, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | Centura 5200 MetalApplied Materials | Concept Two Dual SequelLam Research |
|---|---|---|
| OEM | Applied Materials | Lam Research |
| Category | Deposition | Deposition |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials Centura 5200 | Lam Research Concept Two |
| Specifications | ||
| Configuration | Ti/TiN MCVD[1] | RPC (2)[2] |
| Flat Type | — | Semi Notched[2] |
| Wafer Substrate | — | Silicon[2] |
| Software Version & Build | — | Sequel 4.94 B 38[2] |
| DLVM Mfg Type | — | Refurb - SSEMVIT[2] |
| PM 2 (Left) | — | Sequel[2] |
| PM 2 (Left) Mfg Type | — | Refurb - SSEMVIT[2] |
| PM 3 (Center) | — | Sequel[2] |
| PM 3 (Center) Mfg Type | — | Refurb - SSEMVIT[2] |
| PM 4 (Right) | — | Blank-Off[2] |
| Cable Length | — | 75 ft[2] |
| Wafer Cassette | — | Entegris FA 200-8 MT 7902[2] |
| Front End Option | — | SMIF Ready[2] |
| User Interface Option | — | SMIF Ready[2] |
| User Interface Options | — | Cleanroom (Right Side)[2] |
| Paddle and Arc Kits | — | STD[2] |
| Cool Station Options | — | 4 Shelf Cool Station[2] |
| Particle Check Options | — | Particle Sensor Manifold[2] |
| QTY | — | 3 Systems (Single shrink chamber and dual standard chamber)[3] |
| Voltage | — | 208 V[4] |
| Phase | — | 3 Phase[4] |
| Category | — | Chemical Vapor Deposition (CVD)[2] |
| Wafer Size | — | 8 inch[2] |
| Voltage / Frequency / Phase | — | 208 V, 50/60 Hz, 3 Phase[4] |
| Full Load Current | — | 10 A[4] |
| Max Component Current | — | 5 Amp[4] |
| Software Version | — | Sequel 4.94 B 38[2] |
| Showerhead Material | — | AL 6061[2] |
| Pressure Control | — | MKS[2] |
| Manometers | — | Heated[2] |
| Facilities Kits | — | Bottom[2] |
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