Comparison ledger
Applied Materials Centura 5200 Metal, Lam Research Concept Three Speed, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | Centura 5200 MetalApplied Materials | Concept Three SpeedLam Research |
|---|---|---|
| OEM | Applied Materials | Lam Research |
| Category | Deposition | Deposition |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials Centura 5200 | Lam Research Concept Three |
| Cited variants | — |
|
| Specifications | ||
| Configuration | Ti/TiN MCVD[1] | Triple Speed NF[2] |
| Process | CVD (Chemical Vapor Deposition)[1] | CVD (Chemical Vapor Deposition)[4] |
| Wafer size | 8 inch[1] | — |
| Process chambers | Chamber A – MCVD TiN; Chamber B – MCVD TiN; Chamber C – MCVD Ti; Chamber D – MCVD Ti[1] | — |
| Ti/TiN MCVD | 1[3] | — |
| Speed Handler Type | — | WTS IMM[2] |
| Primary User Interface | — | Flat Panel Right[2] |
| WTS Vacuum PEC Location | — | Port 5[2] |
| Module A Location | — | Port 2[2] |
| Module B Location | — | Port 3[2] |
| Module C Location | — | Port 4[2] |
| Handler Facilities | — | Bottom[2] |
| Interconnect Cable | — | Length 75 Feet[2] |
| Software Version | — | 5.73[2] |
| Software Build | — | 78[2] |
| Operating System | — | Windows XP/2000[2] |
| User Interface Type | — | Ballroom[2] |
| Signal Tower Operation | — | 3 Color Light Tower(RYG)[2] |
| FOUP ID Reader Type | — | OMRON[2] |
| ATM Robot End Effector | — | Vacuum[2] |
| OEM | — | Lam / Novellus[4] |
| Model | — | Concept Three Speed[4] |
| Wafer Size | — | 12 inch[4] |
| Vintage | — | 2005[4] |
| Interconnect Cable Length | — | 75 Feet[2] |
| Front End Robot Type | — | Brooks ATR 8[2] |
| TM Robot Type | — | Brooks Mag 7[2] |
| IMM Readiness Option | — | No[2] |
| FA Communication Interface | — | No[2] |
| Handler Leak Check Shut Off Valve | — | No[2] |
| Make | — | Lam / Novellus[4] |
| Equipment type | — | CVD (Chemical Vapor Deposition)[4] |
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