Waferpedia

Comparison ledger

0242-36515 RTP XE Chamber Temperature Match Kitversus5200 Diffusion

Applied Materials 0242-36515 RTP XE Chamber Temperature Match Kit, Thermco 5200 Diffusion, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
OEMApplied MaterialsThermco
CategoryThermal / DiffusionThermal / Diffusion
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
Family—Thermco 5200 Diffusion
Specifications
Configuration—Boron[1]
Make—Thermco[2]
Model—5200[2]
Wafer size—6 inch[2]
Process chambers—Two to four-process chamber systems[3]
Substrate diameter—Up to 150 mm[3]
Applications—Semiconductor, PV, LED, Nano, and MEMS substrates[3]
Control system—Thermco TMX controller[3]
Heating zones—3 independently controlled heating zones[3]
Operating temperature range—200°C to 1350°C[3]
Flatzone—1,100 mm[3]

Plan your fab

Building a Thermal / Diffusion process? Get a complete equipment list.

Open the fab equipment planner →
Sources (3)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]Equipment inventory listing
  3. [3]thermcosystems.comthermcosystems.com