Waferpedia

Comparison ledger

0041-39086 ESC PartversusTrias 200 SPA

Applied Materials 0041-39086 ESC Part, Tokyo Electron Trias 200 SPA, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0041-39086 ESC PartApplied Materials
Trias 200 SPATokyo Electron
OEMApplied MaterialsTokyo Electron
CategoryEtchEtch
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
Family—Tokyo Electron Trias 200 SPA
Cited variants—
  • TEL Trias 200 SPA (Dry Etch)[1]
  • TEL Trias 200 SPA (CVD)[2]
Specifications
Wafer Size—300 mm[1]
Process Type—Dry Etch[1]

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Sources (2)Every fact above is drawn from these public sources
  1. [1]fabsurplus.comfabsurplus.com
  2. [2]fabsurplus.comfabsurplus.com