Comparison ledger
Applied Materials 0041-39086 ESC Part, Lam Research Rainbow 4520 Oxide, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0041-39086 ESC PartApplied Materials | Rainbow 4520 OxideLam Research |
|---|---|---|
| OEM | Applied Materials | Lam Research |
| Category | Etch | Etch |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | — | Lam Research Rainbow 4520 Oxide |
| Cited variants | — |
|
| Specifications | ||
| Model | — | Rainbow 4520[2] |
| Wafer Size | — | 6 inch[1] |
| Vintage | — | 1996[3] |
| Wafer Size Range Minimum | — | 150 mm[4] |
| Wafer Size Range Maximum | — | 200 mm[4] |
| Set Size | — | 200 mm[4] |
| Software Revision Level | — | E1.7-024[4] |
| Power Requirements | — | 208 V, 50.0 A, 50/60 Hz[4] |
| Weight | — | 1,764 lb (800 kg)[4] |
| Exterior Dimensions | — | 47.244 in (120.0 cm) W x 98.425 in (250.0 cm) D x 66.929 in (170.0 cm) H[4] |
| Manufacturer | — | Lam Research[2] |
| Category | — | Etch[2] |
| Wafer Configuration | — | 8" (200mm) SEMI[5] |
| Features | — | Single wafer etching; wafer temperature control; variable gap spacing; parallel plate reactor; inductive RF auto tuning; simple and efficient design[6] |
| Applications | — | Contact Etch; Planarization; Via Etch; Trench Mask Etch; Pad Etch[6] |
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