Waferpedia

Comparison ledger

0020 23839 PartversusTrias Metal

Applied Materials 0020 23839 Part, Tokyo Electron Trias Metal, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0020 23839 PartApplied Materials
Trias MetalTokyo Electron
OEMApplied MaterialsTokyo Electron
CategoryDepositionDeposition
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0020 23839 PartTokyo Electron Trias
Specifications
ConfigurationPlate, Sensor Clamp, Hdpcvd Ultima +[1]Ti/TiN[2]
Process type—Metal Chemical Vapor Deposition (CVD)[2]
Wafer size—12 inch[2]
Deposited material—Ti/TiN[2]

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Sources (4)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]inventory listing
  3. [3]fabsurplus.comfabsurplus.com
  4. [4]fabsurplus.comfabsurplus.com