Waferpedia

Comparison ledger

0020 18455 PartversusPECVD3

Applied Materials 0020 18455 Part, Oxford Instruments PECVD3, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0020 18455 PartApplied Materials
PECVD3Oxford Instruments
OEMApplied MaterialsOxford Instruments
CategoryDepositionDeposition
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0020 18455 PartOxford Instruments PECVD3
Specifications
ConfigurationShaft,Rf In Local Match, Hdpcvd,Rev3[1]—
OEM—Oxford Instruments[2]
Model—PECVD3[2]
Equipment listing—Oxford Plasmalab System 100 PECVD System[2]
Process manual reference—PECVD Overview from Oxford Instruments[3]
Process specification—Oxford PECVD3 - SiOx[2]

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Sources (3)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]nanolab.berkeley.edunanolab.berkeley.edu
  3. [3]nanolab.berkeley.edunanolab.berkeley.edu