Comparison ledger
Applied Materials 0020 18455 Part, Applied Materials Endura 5500, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0020 18455 PartApplied Materials | Endura 5500Applied Materials |
|---|---|---|
| OEM | Applied Materials | Applied Materials |
| Category | Deposition | Deposition |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | 1990– |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0020 18455 Part | Applied Materials Endura 5500 |
| Cited variants | — | |
| Specifications | ||
| Configuration | Shaft,Rf In Local Match, Hdpcvd,Rev3[4] | Main AC Power Intel Hole[5] |
| Line Frequency | — | 50 Hz[5] |
| Wafer Shape | — | SNNF[5] |
| Position 1 | — | Dura TTN[5] |
| Position 1 Process | — | Durasource TTN[5] |
| Position 2 | — | Aluminum[5] |
| Position 2 Process | — | Durasource AL[5] |
| Position 3 | — | Dura TTN[5] |
| Position 3 Process | — | Durasource TTN[5] |
| Position 4 | — | Aluminum[5] |
| Position 4 Process | — | Durasource AL[5] |
| Position A | — | Pass Thru[5] |
| Software | — | v8.89[10] |
| Robot | — | HP with Fabworx Blade, Wrist, and Arms[10] |
| Ch1/ch3 | — | AICu[10] |
| Pedestal | — | A101[10] |
| ChE/ChF | — | Orient Degas[10] |
| Ch1 | — | Ti[11] |
| Ch3 | — | AICu[11] |
| Ch2/Ch4 | — | TiN[11] |
| ChC/ChD | — | RF PCII[11] |
| Ch2/Ch3 | — | AICuW[12] |
| Ch4 | — | TiN[12] |
| ChC | — | RF PCII[12] |
| ChE | — | Orient Degas[12] |
| Ch2 | — | AICuW[13] |
| Voltage | — | 430 VAC[16] |
| Phase | — | 3 Phase[18] |
| Frequency | — | 60 Hz[19] |
| 4 PVD Chambers | — | 2TiN/1Ti/1Al[20] |
| 2 CVD / 3 PVD Chambers | — | 2TxZ/1Ti/1IMP Ti/1Co[1] |
| 5 PVD Chambers | — | 2TiN/1Ti/1Al/1NiPt[22] |
| Wafer Size | — | 8 inch (200 mm)[5] |
| Electrical Configuration | — | 3 Phase, 3 Wire + Ground, 480 Vac[22] |
| Chamber Configuration (example 1) | — | 5 PVD Chambers: 2 TiN, 1 Ti, 1 Al, 1 NiPt[22] |
| Chamber Configuration (example 2) | — | 2 CVD / 3 PVD Chambers: 2 TxZ, 1 Ti, 1 IMP Ti, 1 Co[1] |
| Transfer Chamber Positions (example) | — | Position 1: Durasource TTN, Position 2: Durasource AL, Position 3: Durasource TTN, Position 4: Durasource AL[5] |
| Buffer Chamber Positions (example) | — | Position A: Pass Thru, Position B: Cooldown, Position C: Durasource TI, Position F: Orienter (Standard Degas)[5] |
| System Safety Features | — | EMO (Turn to Release), GFI on Primary with EMO Shunt Trip, GFI on Secondary, Circuit Breaker 400 A, GFI Trip 50-100 mA, Water Leak Detector, Smoke Detector[5] |
| Position B | — | Cooldown[5] |
| Position C | — | Titanium[5] |
| Position C Process | — | Durasource TI[5] |
| Position F | — | Orienter[5] |
| Position F orient Type | — | Standard Degas with Temp feedback (Gimball Type)[5] |
| System EMO Type | — | Turn to Release[5] |
| Primary Side Trip Amperage | — | 3 P 3 L 208 VAC[5] |
| Circuit Breaker on Secondary | — | 400 A[5] |
| GFI Trip Amperage | — | 50 ~ 100 mA[5] |
| Wafer Sizes | — | 8 inch[5] |
| Vintage | — | 2000[22] |
| Chamber Configuration (Transfer Chamber) | — | Position 1: Dura TTN, Position 2: Aluminum, Position 3: Dura TTN, Position 4: Aluminum[5] |
| Buffer Chamber Positions | — | Pass Thru, Cooldown, Titanium, Orienter (Standard Degas with Temp feedback)[5] |
| Chamber Configuration | — | 2 CVD / 3 PVD Chambers: 2TxZ/1Ti/1IMP Ti/1Co[1] |
| Robot Type | — | VHP[3] |
| Application | — | Liner/Barrier[1] |
| Electrical | — | 3 Phase - 3 Wire + Ground - 60 Hz - 480 Vac[22] |
| PVD Chamber Count | — | 5[3] |
| PVD Chamber Types | — | 2TiN/1Ti/1Al/1NiPt[3] |
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