Waferpedia

Comparison ledger

0020 17485 PartversusGasonics Triple Speed NF

Applied Materials 0020 17485 Part, Lam Research Gasonics Triple Speed NF, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0020 17485 PartApplied Materials
OEMApplied MaterialsLam Research
CategoryDepositionDeposition
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0020 17485 PartLam Research Gasonics
Specifications
ConfigurationStrap, RF Out 2 Balanced Coil Match, Hdp[1]3 ch (HDP)[2]
Process type—Chemical Vapor Deposition (CVD)[2]
Number of chambers—3 (HDP)[2]
Robot—Brooks robot[2]
SLM type—SLM type[2]
Ports—3 port[2]
Loadlock helium reduction—loadlock helium reduction[2]
Vintage year—2008[2]

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Sources (2)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]inventory listing