Waferpedia

Comparison ledger

0020 17485 PartversusConcept Three Speed

Applied Materials 0020 17485 Part, Lam Research Concept Three Speed, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0020 17485 PartApplied Materials
OEMApplied MaterialsLam Research
CategoryDepositionDeposition
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0020 17485 PartLam Research Concept Three
Cited variants—
  • Triple Speed NF[1]
Specifications
ConfigurationStrap, RF Out 2 Balanced Coil Match, Hdp[2]Triple Speed NF[1]
Speed Handler Type—WTS IMM[1]
Primary User Interface—Flat Panel Right[1]
WTS Vacuum PEC Location—Port 5[1]
Module A Location—Port 2[1]
Module B Location—Port 3[1]
Module C Location—Port 4[1]
Handler Facilities—Bottom[1]
Interconnect Cable—Length 75 Feet[1]
Software Version—5.73[1]
Software Build—78[1]
Operating System—Windows XP/2000[1]
User Interface Type—Ballroom[1]
Signal Tower Operation—3 Color Light Tower(RYG)[1]
FOUP ID Reader Type—OMRON[1]
ATM Robot End Effector—Vacuum[1]
OEM—Lam / Novellus[3]
Model—Concept Three Speed[3]
Process—CVD (Chemical Vapor Deposition)[3]
Wafer Size—12 inch[3]
Vintage—2005[3]
Interconnect Cable Length—75 Feet[1]
Front End Robot Type—Brooks ATR 8[1]
TM Robot Type—Brooks Mag 7[1]
IMM Readiness Option—No[1]
FA Communication Interface—No[1]
Handler Leak Check Shut Off Valve—No[1]
Make—Lam / Novellus[3]
Equipment type—CVD (Chemical Vapor Deposition)[3]

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Sources (3)Every fact above is drawn from these public sources
  1. [1]Equipment inventory listing
  2. [2]inventory listing
  3. [3]Equipment inventory listing