Comparison ledger
Applied Materials 0020 17485 Part, Denton Vacuum Discovery Cathode, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0020 17485 PartApplied Materials | Discovery CathodeDenton Vacuum |
|---|---|---|
| OEM | Applied Materials | Denton Vacuum |
| Category | Deposition | Deposition |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0020 17485 Part | Denton Vacuum Discovery |
| Specifications | ||
| Configuration | Strap, RF Out 2 Balanced Coil Match, Hdp[1] | 12.0" sputtering system with planetary Load lock and robot loading assemblies[2] |
| Sputtering system size | — | 12.0 inch[2] |
| Chamber dimensions | — | Approx. 4' X 6' X 12" Stainless Steel Chamber[2] |
| Ion source | — | Veeco 5 cm Gridded Ion Source with Gas Controls[3] |
| High vacuum pump | — | CTI Cryogenics High Vacuum Pump/Blanket Heater[2] |
| Cryopump | — | Torr400 Cryopump with Oxford E500 Dual Temperature Monitor[2] |
| Turbo molecular pump | — | KYKY F400 Turbo Molecular Pump with FV-LII Pump Controller[2] |
| Compressor | — | CTI-Cryogenics 9600 Compressor[2] |
| DC power supplies | — | (4) Advance Energy Pinnacle plus DC Power Supplies[3] |
| Cathodes | — | (4) 12" Cathodes[2] |
| Robot | — | Loader/Unloader with Epson G6-453c Robot, Vintage 9/10[2] |
| Controller | — | Ion Tech Mps-3000 fc Controller[2] |
| Load lock | — | Load Lock Loader with PLC Controller[2] |
| Gate valve | — | Vat Gate Valve[2] |
| Adaptive pressure controller | — | Vat Adaptive Pressure Controller[2] |
| Pressure monitors | — | Assorted Pressure Monitors[2] |
| Isolation valves | — | Isolation Valves[2] |
| Power supply/control | — | Stand Alone Power Supply/Control[2] |
| Computer system | — | Computer System with Related Hardware/Software[2] |
| Manufacturer | — | Denton Vacuum[2] |
| Model | — | Discovery Cathode[2] |
| Category | — | Deposition[3] |
| Process type | — | Sputtering system[3] |
| Wafer size | — | 12.0-inch[3] |
| Wafer handling | — | Planetary load lock and robot loading assemblies[3] |
| Chamber | — | Approx. 4' x 6' x 12" stainless steel chamber[2] |
| Vacuum pumps | — | CTI Cryogenics high vacuum pump/blanket heater; Torr400 cryopump with Oxford E500 dual temperature monitor; KYKY F400 turbo molecular pump with FV-LII pump controller[2] |
| Pressure control | — | Vat gate valve and Vat adaptive pressure controller[2] |
| Control system | — | Ion Tech Mps-3000 fc controller; stand alone power supply/control; computer system with related hardware/software[2] |
| Robot loader/unloader | — | Epson G6-453c robot[2] |
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