Waferpedia

Comparison ledger

0020 17485 PartversusDesk II

Applied Materials 0020 17485 Part, Denton Vacuum Desk II, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0020 17485 PartApplied Materials
Desk IIDenton Vacuum
OEMApplied MaterialsDenton Vacuum
CategoryDepositionDeposition
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0020 17485 PartDenton Vacuum Desk
Specifications
ConfigurationStrap, RF Out 2 Balanced Coil Match, Hdp[1]Metal[2]
Weight—103 lbs[3]
Dimensions—21 x 21 x 24 inches[3]
Electrical—115V/220V 50/60 Hz[3]
Argon gas requirement—5 psig, 99.99% purity[3]
Turbomolecular pump speed—100 lps[3]
Ultimate vacuum—10-6 Torr[3]
Mechanical pump speed—60 lpm[3]
Chamber diameter—6 inches[3]
Wafer size—8 inch[2]
Available targets—Gold, Gold/Palladium (60:40), Chromium[4]
Carbon evaporation accessory—Available[4]
Cycle time—Less than 5 minutes[3]

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Sources (4)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]inventory listing
  3. [3]web.archive.orgweb.archive.org
  4. [4]nanolab.ucla.edunanolab.ucla.edu