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Comparison ledger

0020 12458 PartversusPlasmaPro NGP 1000

Applied Materials 0020 12458 Part, Oxford Instruments PlasmaPro NGP 1000, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0020 12458 PartApplied Materials
PlasmaPro NGP 1000Oxford Instruments
OEMApplied MaterialsOxford Instruments
CategoryDepositionDeposition
Wafer size—up to 450mm wafer size
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0020 12458 PartOxford Instruments PlasmaPro NGP 1000
Cited variants—
  • PlasmaPro NGP1000 ICP 380[1]
  • Oxford PlasmaPro NGP1000 ICP 380[1]
Specifications
ConfigurationInsulator,Side Match,Hdp-Cvd Ultima Plus[2]Load Locked Chamber[3]
Asset number146526[2]—
MakeApplied Materials[2]—
Model0020 12458[2]—
Wafer size—up to 450mm wafer size[3]
Power—600W 13.56Mhz HF RF Generator[3]
Process Type—Plasma-Enhanced Chemical Vapor Deposition (PECVD)[3]
Wafer Size—up to 450mm[3]
Chamber—Load Locked Chamber[3]
Lower Electrode Diameter—490mm[3]
Lower Electrode Material—Aluminum[4]
Maximum Temperature—400°C[4]
RF Power (HF)—600W at 13.56MHz[3]
RF Power (LF)—600W at 100kHz[3]
RF Configuration—Dual Frequency RF with Pulsing for Film Stress Control[3]
Process Pump—Adixen ADS602P Dry Pump[4]
Load Lock Pump—Load Lock vacuum pump[4]
Gas Box—X20 External Gas Box with up to 12 Gas Lines[3]
Gas Configuration—He, CF4, N2, N20, NH3, SiH4-N2[3]
Control Software—Windows 7 with PC4500 Control Software[3]
PLC—X20 PLC[3]
Chamber Lift—Gas-Shock assisted Chamber Lift Mechanism[3]
Chamber Heating—Chamber Heating Kit (Heats Chamber Sidewalls to Minimize Process Deposition)[3]
Wafer handling—Load Locked Chamber[4]
HF RF power—600W at 13.56MHz[4]
LF RF power—600W at 100kHz[4]

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Sources (4)Every fact above is drawn from these public sources
  1. [1]classoneequipment.comclassoneequipment.com
  2. [2]inventory listing
  3. [3]inventory listing
  4. [4]waferpedia.comwaferpedia.com