Comparison ledger
Applied Materials 0010 47763, Lam Research SEZ SP 203 Spin, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010 47763Applied Materials | SEZ SP 203 SpinLam Research |
|---|---|---|
| OEM | Applied Materials | Lam Research |
| Category | Etch | Etch |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010 47763 | Lam Research SEZ SP 203 |
| Specifications | ||
| Configuration | 2nd Source New[1] | 50/60 Hz[4] |
| Type | Monopolar Dual Heated[2] | — |
| Description | ASSY, ESC, BONDED, MONOPOLAR DUAL HEATED[3] | — |
| Possible Materials | Al2O3 (aluminum oxide) or AlN (aluminum nitride)[2] | — |
| Model | 0010-47763[1] | SEZ SP 203 Spin[4] |
| OEM | Applied Materials[1] | Lam Research[6] |
| Material (possible) | Al2O3 (aluminum oxide) or AlN (aluminum nitride)[2] | — |
| Application | Fixing wafers in etching process (PVD, CVD, ETCH)[2] | — |
| Quantity available (source) | 1[2] | — |
| Voltage | — | 400 VAC[4] |
| Max. Current | — | 32 A[4] |
| Breaking Capacity | — | 10.000 AIC[4] |
| Power | — | 400V, 50 Hz, 3-Phase[5] |
| Phase | — | ENI VL-400 Phase Shift Controller[5] |
| Roughing Pump Code | — | A532-80-905[5] |
| Category | — | Etch[6] |
| Tool type | — | Spin etcher[6] |
| Wafer size | — | 150mm[7] |
| Vintage | — | 1999[7] |
| Process pump status | — | Process pump in one chemical cabinet (sub tool) has malfunction[4] |
Plan your fab
Building a Etch process? Get a complete equipment list.
Open the fab equipment planner →